Abstract
Full Text
Chemistry
Corresponding Member of the Academy of Sciences of the USSR K. A. Andrianov and G. Ya. Rumba
On Rearrangements of Hexamethyl- and Octamethylcyclosilazanes
There are no data in the literature on rearrangements of organocyclosilazanes. We found that in the series of dimethylcyclosilazanes a rearrangement is observed with a change in the silicon–nitrogen framework of the molecules. Thus, for example, when hexamethylcyclotrisilazane is acted upon by trimethylchlorosilane and ammonia, ring expansion already occurs at 20–40°. Along with the normal reaction products, namely octamethyltrisilazane and a polymer (with a molecular weight of about 2000), which is formed in an amount of 12.3 and 18.9% of the high-boiling reaction products, 36.5% of octamethylcyclotetrasilazane is formed:
\[ \chemfig{% Si(-[:120]CH_3)(-[:60]CH_3) (-[:-135]HN(-[:-90]Si(-[:180]CH_3)(-[:-150]CH_3)(-[:-45]NH))) (-[:-45]NH(-[:-90]Si(-[:0]CH_3)(-[:-30]CH_3)(-[:-135]NH))) } \;+\; (\mathrm{CH_3})_3\mathrm{SiCl}+\mathrm{NH_3} \;\longrightarrow \]
\[ \longrightarrow\; (\mathrm{CH_3})_3\mathrm{SiNHSi}(\mathrm{CH_3})_2\mathrm{NHSi}(\mathrm{CH_3})_3 \;+\; \chemfig{% Si(-[:90]CH_3)(-[:180]CH_3) (-[:0]NH-Si(-[:90]CH_3)(-[:0]CH_3)(-[:-90]NH-Si(-[:-90]CH_3)(-[:180]CH_3)-NH-)) (-[:-90]HN-Si(-[:-90]CH_3)(-[:180]CH_3)-NH-) } \;+\;\text{polymers} \]
When hexamethylcyclotrisilazane is heated for 48 hr at 250° in the presence of ammonium chloride, about 3% octamethylcyclotetrasilazane is formed.
The rearrangement reaction in the presence of trimethylchlorosilane and ammonia, or of ammonium chloride, may be represented as follows: under the conditions of our experiments, hydrogen chloride is formed upon the action of ammonia on trimethylchlorosilane, or as a result of the thermal dissociation of ammonium chloride. Hydrogen chloride, acting on the silicon–nitrogen bond, opens the ring:
\[ \chemfig{% Si(-[:120]CH_3)(-[:60]CH_3) (-[:-135]HN(-[:-90]Si(-[:180]CH_3)(-[:-150]CH_3)(-[:-45]NH))) (-[:-45]NH(-[:-90]Si(-[:0]CH_3)(-[:-30]CH_3)(-[:-135]NH))) } \;+\;\mathrm{HCl} \;\rightleftharpoons\; \chemfig{% Si(-[:120]CH_3)(-[:60]CH_3)(-[:0]Cl) (-[:-135]HN(-[:-90]Si(-[:180]CH_3)(-[:-150]CH_3)(-[:-45]NH))) (-[:-45]NH_2-[:0]Si(-[:0]CH_3)(-[:-30]CH_3)(-[:-135]NH)) } \]
Ammonia reacts with chlorine bound to silicon
\[ \begin{gathered} \text{chlorinated hexamethylcyclotrisilazane derivative} \;+\;\mathrm{NH_3} \rightleftarrows \text{amino hexamethylcyclotrisilazane derivative} \;+\;\mathrm{HCl}. \end{gathered} \]
Thus hydrogen chloride is regenerated, which cleaves the silicon–nitrogen bond according to the scheme:
\[ \begin{gathered} \text{amino hexamethylcyclotrisilazane derivative} \;+\;\mathrm{HCl} \rightleftarrows \text{chlorosilyl- and aminosilyl-containing linear intermediates} \\ \text{or} \\ \text{chlorosilyl- and aminosilyl-containing cyclic intermediates}. \end{gathered} \]
The intermediate compounds formed as a result of recombination give both hexamethylcyclotrisilazane and octamethylcyclotetrasilazane. The same result was obtained when hexamethylcyclotrisilazane was treated with triethylmethylammonium iodide at \(300^\circ\).
An analogous rearrangement reaction with ring expansion was also observed by us when hexamethylcyclotrisilazane was treated with catalytic amounts of caustic potash at \(160^\circ\). A small amount of octamethylcyclotetrasilazane was isolated. It is of special interest to note that, on heating octamethylcyclotetrasilazane with catalytic amounts of ammonium chloride at \(280^\circ\), rearrangement with ring contraction occurs, and hexamethylcyclotrisilazane is formed in low yield:
\[ 3\,\text{octamethylcyclotetrasilazane} \;\xrightarrow[\;]{\mathrm{NH_4Cl}}\; 4\,\text{hexamethylcyclotrisilazane}. \]
Rearrangement with ring contraction also occurs when octamethylcyclotetrasilazane is treated with aniline at \(250\text{—}300^\circ\). Here, along with the transamination reaction, rearrangement also takes place, and about \(20\%\) of tri-\(N\)-phenylhexamethylcyclotrisilazane is formed:
\[ 3\,\text{octamethylcyclotetrasilazane} +12\,\mathrm{C_6H_5NH_2} \rightarrow 4\,\text{tri-}N\text{-phenylhexamethylcyclotrisilazane} +12\,\mathrm{NH_3}. \]
The experimental conditions are given in Table 1.
Experimental Part
1. Aminolysis of trimethylchlorosilane in a solution of hexamethylcyclotrisilazane. In \(65.4\) g (\(0.3\) g-mol) of hexamethylcyclotrisilazane, \(7\) ml (\(0.06\) g-mol) of trimethylchlorosilane was dissolved.
With vigorous stirring, dry ammonia was introduced. During the reaction a white precipitate separated. The reaction mixture was filtered. On washing with petroleum ether, part of the precipitate dissolved. After evaporation of the resulting solution, 5.8 g (8.3%) of a crystalline substance with m.p. 96° was obtained. The filtrate was distilled, collecting fractions: 165–180°, 1.50 g, 28%, \(n_D^{20}\) 1.4300, corresponding to octamethyltrisilazane; 180–188°, 17.73 g, 33.6%, \(n_D^{20}\) 1.4443. From the residue 14.9 g (28.3%) of a crystalline substance with m.p. 96° was isolated. After removal of volatiles up to 250°, 6.5 g (12.3%) of a light-yellow, vaseline-like product with an average molecular weight of 2000 remained.
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Heating hexamethylcyclotrisilazane with ammonium chloride. 21.9 g (0.1 g-mol) of hexamethylcyclotrisilazane and 0.1 g of ammonium chloride were heated for 48 h at 220–250°. After heating, 0.65 g of crystals with m.p. 96° was isolated.
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Heating hexamethylcyclotrisilazane with triethylmethylammonium iodide. 21.9 g (0.1 g-mol) of hexamethylcyclotrisilazane and 0.1 g of triethylmethylammonium iodide were heated for 17 h at 300°. After heating, 0.8 g of crystals with m.p. 96° was isolated.
Table 1
| Starting substance | Reagents | Reaction duration, h | Reaction temp., °C | Rearrangement product | M.p., °C | \(n_D^{20}\) | Literature data |
|---|---|---|---|---|---|---|---|
| \([(CN_3)_2SiNH]_3\) | \((CH_3)_3SiCl + NH_3\) | 20–40 | \([(CH_3)_2SiNH]_4\) | 96 | 97° (1) | ||
| \([(CH_3)_2SiNH]_3\) | \(NH_4Cl\) | 48 | 220–250 | \([(CH_3)_2SiNH]_4\) | 96 | 97° | |
| \([(CH_3)_2SiNH]_3\) | \([(C_2H_5)_3N]J \downarrow CH_3\) | 17 | 300 | \([(CH_3)_2SiNH]_4\) | 96 | 97° | |
| \([(CH_3)_2SiNH]_3\) | KOH | 216 | 160 | \([(CH_3)_2SiNH]_4\) | 96 | 97° | |
| \([(CH_3)_2SiNH]_4\) | \(C_6H_5NH_2\) | 24 | 300 | \([(CH_3)_2SiNC_6H_5]_3\) | 248–249 | 249–250° (2) | |
| \([(CH_3)_2SiNH]_4\) | \(NH_4Cl\) | 72 | 300 | \([(CH_3)_2SiNH]_3\) | b.p. 186–188 | 1.4436 | 188°, (1) 1.4448 |
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Heating hexamethylcyclotrisilazane with caustic potash. 10.0 g of hexamethylcyclotrisilazane and 0.1 g of caustic potash were heated for 216 h at 160°. The reaction mixture was dissolved in petroleum ether, filtered, and evaporated. 4.9 g of tricyclotridecamethylheptasilazane and 0.1 g of crystals with m.p. 96° were isolated.
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Heating octamethylcyclotetrasilazane with aniline. 29.2 g (0.1 g-mol) of octamethylcyclotetrasilazane and 18.6 g (0.2 g-mol) of aniline were heated for 24 h at 300°. The reaction mixture was distilled; from the distillate, 5.8 g of crystals with m.p. 248–249° was isolated.
Found, %: C 64.47, 64.37; H 7.87, 7.92; Si 18.65, 19.02; N 10.78, 10.75.
\(C_{24}H_{33}Si_3N_3\). Calculated, %: C 64.38; H 7.43; Si 18.80; N 9.38.
For tri-N-phenylhexamethylcyclotrisilazane, \(C_{24}H_{33}Si_3N_3\), calculated, %: C 64.38; H 7.43; Si 18.80; N 9.38.
- Heating octamethylcyclotetrasilazane with ammonium chloride. 5 g of octamethylcyclotetrasilazane and 0.1 g of ammonium chloride were heated for 72 h at 300°. After cooling, a drop of liquid with \(n_D^{20}\) 1.4436 was pressed out.
29.2 g (0.1 g-mol) of octamethylcyclotetrasilazane, 1.6 g (0.01 g-mol) of hexamethylcyclotrisilazane, and 0.5 g of ammonium chloride were heated for 48 h at 245°. From the reaction mixture 2.52 g of liquid with b.p. 186–188° and \(n_D^{20}\) 1.4436 was distilled off.
Institute of Organoelement Compounds
Academy of Sciences of the USSR
Received
17 V 1962
CITED LITERATURE
- S. D. Brewer, Ch. P. Haber, J. Am. Chem. Soc., 70, 3888 (1948).
- E. Larsson, B. Smith, Acta chem. scand., 3, 487 (1949).